Pattern stabilization through parameter alternation in a nonlinear optical system
Year: 2006
Authors: Sharpe J.P., Ramazza P.L., Sungar N., Saunders K.
Autors Affiliation: Calif Polytech State Univ San Luis Obispo, Dept Phys, San Luis Obispo, CA 93407 USA; Ist Nazl Ottica, I-50125 Florence, Italy
Abstract: We report the first experimental realization of pattern formation in a spatially extended nonlinear system when the system is alternated between two states, neither of which exhibits patterning. Dynamical equations modeling the system are used for both numerical simulations and a weakly nonlinear analysis of the patterned states. The simulations show excellent agreement with the experiment. The nonlinear analysis provides an explanation of the patterning under alternation and accurately predicts both the observed dependence of the patterning on the frequency of alternation and the measured spatial frequencies of the patterns.
Journal/Review: PHYSICAL REVIEW LETTERS
Volume: 96 (9) Pages from: 94101-1 to: 94101-4
KeyWords: FeedbackDOI: 10.1103/PhysRevLett.96.094101ImpactFactor: 7.072Citations: 14data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2024-10-06References taken from IsiWeb of Knowledge: (subscribers only)Connecting to view paper tab on IsiWeb: Click hereConnecting to view citations from IsiWeb: Click here