Modulating the thickness of the resist pattern for controlling size and depth of submicron reversed domains in lithium niobate
Year: 2006
Authors: Ferraro P., Grilli S.
Autors Affiliation: CNR – Istituto Nazionale di Ottica Applicata (INOA) del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy
Abstract: In this letter the electric field overpoling is used in combination with two-dimensional resist gratings exhibiting modulated topography and obtained by moire interference lithography. The technique allows one to fabricate shallow submicron domains with lateral size and depth modulated according to the resist profile. Simulations of the electric field distribution in the crystal, in this specific poling configuration, are performed to interpret the mechanism leading to the formation of those surface domains. The results show that in principle complex domain structures could be designed for applications in the field of photonic crystals. (c) 2006 American Institute of Physics.
Journal/Review: APPLIED PHYSICS LETTERS
Volume: 89 (13) Pages from: 133111-1 to: 133111-3
More Information: This research was partially funded by the MIUR Project No. 77 DD N.1105/2002 and by the MIUR within the FIRB project Microdipositivi fotonici in niobato di litio N. RBNE01KZ94. The authors are grateful to Alenia-Aeronautica for providing analysis by SEM.KeyWords: Lithography; CrystalsDOI: 10.1063/1.2357928ImpactFactor: 3.977Citations: 17data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2024-12-01References taken from IsiWeb of Knowledge: (subscribers only)Connecting to view paper tab on IsiWeb: Click hereConnecting to view citations from IsiWeb: Click here