A microstructural study of transparent metal oxide gas barrier films

Anno: 1999

Autori: Henry B.M., Dinelli F., Zhao K.-Y., Grovenor C.R.M., Kolosov O.V., Briggs G.A.D., Roberts A.P., Kumar R.S., Howson R.P.

Affiliazione autori: Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom (UK)
Department of Physics, Loughborough University, Loughborough, Leicestershire LE11 3TU, UK

Abstract: The relationship between the microstructure and the water vapour transmission rates of aluminum oxide and aluminum coatings deposited by magnetron sputtering on polyethylene terephthalate have been investigated. The gas barrier properties of the films have been measured as a function of temperature and a range of techniques used to characterize the coatings including atomic force microscopy, which also provided information on the early growth mechanism. It was found that the Al/PET film showed a better water vapour barrier than the AlOx/PET. although the activation energy for water vapour permeation was the same for both. We propose that the interaction of water with the barrier coating plays a significant part in determining the observed gas barrier performance.

Giornale/Rivista: THIN SOLID FILMS

Volume: 355-356      Da Pagina: 500  A: 505

Maggiori informazioni: Conference: 26th International Conference on Metallurgical Coating and Thin Films
Location: SAN DIEGO, CALIFORNIA – Date: APR 12-15, 1999
Sponsor(s):Div Amer Vacuum Soc, Vacuum Metallurgy & Thin Films
Parole chiavi: Aluminum oxide; Aluminum coating; Microstructure; Gas barrier film
DOI: 10.1016/S0040-6090(99)00461-7

Citazioni: 97
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