Investigation on poling of Lithium Niobate patterned by interference lithography
Anno: 2003
Autori: Grilli S., De Nicola S., Ferraro P., Finizio A., De Natale P., Pierattini G., Chiarini M.
Affiliazione autori: Istituto Nazionale di Ottica Applicata, Sez. di Napoli, c/o Istituto di Cibernetica “E. Caianiello” del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy;
Istituto di Cibernetica “E. Caianiello” del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy;
Istituto Nazionale di Ottica Applicata, Largo E. Fermi 6, 50125 Firenze, Italy;
Istituto per la Microelettronica e i Microsistemi (IMM) del CNR, Sez. di Napoli, Via Diocleziano 328, 80124, Napoli, Italy;
Istituto per la Microelettronica e i Microsistemi (IMM) del CNR, Sez. di Bologna, Via P. Gobetti 101, 40129 Bologna, Italy
Abstract: We realized one and two dimensional periodic ferroelectric domain structures obtained by an electric-field poling process applied to 500 μm thick Lithium Niobate crystal samples patterned by means of interference lithography. The fringe pattern is realized using a Michelson interferometric set-up and a He-Cd laser. We report on the appearance of high density and micrometer-sized single dot domains aligned along the direction of the interference fringes, as consequence of overpoling procedures. These structures are similar to those induced by back-switching. The effect seems to be originating by inverted domains” merging under the photoresist fringe pattern after spreading. We investigate the possibility to obtain a highly regular and homogeneous dot-structure which can find application for photonic crystals technology and nonlinear optics.
Giornale/Rivista: PROCEEDINGS OF SPIE
Volume: 4944 Da Pagina: 126 A: 133
Parole chiavi: lithium niobate; interference lithography; Citazioni: 1dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2024-04-28Riferimenti tratti da Isi Web of Knowledge: (solo abbonati) Link per visualizzare la scheda su IsiWeb: Clicca quiLink per visualizzare la citazioni su IsiWeb: Clicca qui