Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals
Anno: 2008
Autori: Paturzo M., Grilli S., Mailis S., Coppola G., Iodice M., Gioffre M., Ferraro P.
Affiliazione autori: CNR INOA, CNR, Inst Appl Opt, Naples, Italy; Univ Southampton, Optoelect Res Ctr, Southampton SO9 5NH, Hants, England; CNR, IMM, Naples, Italy
Abstract: Flexible coherent diffraction lithography is proposed and preliminarily tested by means of an optical phase mask. The phase mask consisted of a two-dimensional hexagonal lattice of reversed ferroelectric domains engineered in a z-cut lithium niobate substrate and was electro-optically tunable. Appropriate phase shift values across adjacent reversed domains were induced by the application of an external electric field along the z-axis of the crystal via transparent electrodes. Photolithographic exposures of the self-imaging near-field diffraction intensity patterns, at various planes corresponding to the Talbot distances, were performed by using different values of the driving electric field signal. (C) 2008 Elsevier B.V. All rights reserved.
Giornale/Rivista: OPTICS COMMUNICATIONS (PRINT)
Volume: 281 (8) Da Pagina: 1950 A: 1953
Parole chiavi: self-imaging; optical lithography; electro-optic materialsDOI: 10.1016/j.optcom.2007.12.056Citazioni: 7dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2024-05-05Riferimenti tratti da Isi Web of Knowledge: (solo abbonati) Link per visualizzare la scheda su IsiWeb: Clicca quiLink per visualizzare la citazioni su IsiWeb: Clicca qui